
In a strategic move that underscores its commitment to maintaining a technological edge, Taiwan Semiconductor Manufacturing Company (TSMC) is poised to receive ASML’s high-NA EUV lithography equipment by the end of 2024. This equipment, particularly the Twinscan EXE:5000, boasts an 8nm resolution and a 13.5nm EUV light wavelength, enabling the production of smaller chips with significantly higher transistor densities. The










